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MATERIALES DENTALES BASADOS EN COMPUESTOS CON PROPIEDADES DE DESPEGADO SEGUN SEA NECESARIO.
专利权人:
IVOCLAR VIVADENT AG
发明人:
Norbert MOSZNER,Thomas HIRT,Kai RIST,Ulrich SALZ,Christoph WEDER,Gina FIORE,Christian HEINZMANN,Volker RHEINBERGER
申请号:
MX2014002746
公开号:
MX341258B
申请日:
2012.09.10
申请国别(地区):
MX
年份:
2016
代理人:
摘要:
The invention relates to a dental material which comprises a thermolabile compound of the formula (I): [(Z1)m-Q1-X)]k-T-[Y -Q2-(Z2)n]l, in which T is a thermolabile unit which comprises at least one thermolabile group based on non-covalent interactions, Z1 and Z2 each independently are a polymerizable group selected from vinyl groups, CH2=CR1-CO-O- and CH2=CR1-CO-NR2- or are an adhesive group selected from -Si(OR)3, -COOH, -O-PO(OH)2, -PO(OH)2, -SO2OH and -SH, Q1 independently in each case is absent or is an (m+1)-valent linear or branched aliphatic C1-C20 radical, which may be interrupted by -O-, -S-, -CO-O-, -O-CO-, -CO-NR3-, -NR3-CO-, -O-CO-NR3-, -NR3-CO-O- or -NR3-CO-NR3-, Q2 independently in each case is absent or is an (n+1)-valent linear or branched aliphatic C1-C20 radical, which may be interrupted by -O-, -S-, -CO-O-, -O-CO-, -CO-NR3-, -NR3-CO-, -O-CO-NR3-, -NR3-CO-O- or -NR3-CO-NR3-, X and Y in each case independently are absent or are -O-, -S-, CO-O-, -O-CO-, -CO-NR3- or -NR3-CO-, R, R1, R2 and R3 each independently are H or a C1-C7 alkyl radical, k and l each independently are 0, 1, 2 or 3, and m and n each independently are 1, 2 or 3.La invención se refiere a un material reparador dental que comprende un compuesto termoinestable de la Fórmula I: [ (Z1)mQ1-X) ]k-T-[Y-Q2-(Z2)n]1 Fórmula I, en la cual T representa una unidad termoinestable o unidad que contiene al menos un grupo termoinestable basado en interacciones no covalentes, Z1 y Z2 en cada caso representa independientemente un grupo polimerizable seleccionado de grupos vinilo, CH2=CR1-CO-O- y CH2=CR1-CO-NR2- o un grupo adhesivo seleccionado de -Si(OR)3, -COOH, -O-PO(OH)2, -PO(OH)2, -SO2OH y -SH, Q1 en cada caso está independientemente perdido o representa un radical C1-C20 alifático lineal o ramificado de valencia (m+1) que puede interrumpirse por -O-, -S-, -CO-O-, -O-CO-, -CO-NR3-, - NR3-CO-, -O-CO-NR3-, -NR3-CO-O- o -NR3-CO-NR3-, Q2 en cada caso está independientemente perdido o representa un rad
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