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Light curing nail polish forming a gel nail without removing residual glue on the surface of the nail
专利权人:
发明人:
PENG, YEN HUA,彭彦华,彭彥華
申请号:
TW104138721
公开号:
TW201717906A
申请日:
2015.11.23
申请国别(地区):
TW
年份:
2017
代理人:
摘要:
A light curing nail polish comprises a polyurethane acrylate copolymer, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 1-hydroxycyclohexyl phenyl ketone, tripropylene glycol diacrylate and diethylene glycol ether acrylate based on the total weight of the light curing nail polish, the polyurethane acrylate copolymer accounts for from 30wt% to 70wt%, the 2,4,6-trimethylbenzoyldiphenylphosphine oxide accounts for from 3wt% to 15wt%, the 1-hydroxycyclohexyl phenyl ketone accounts for from 3wt% to 10wt%, the tripropylene glycol diacrylate accounts for from 5wt% to 20wt%, and the diethylene glycol ether acrylate accounts for from 5wt% to 25wt%. When the light curing nail polish is in use, it is only required to be coated on the nail firstly and then light-cured, so that a gel nail can be formed, without removing residual glue on the surface of the nail and the gel nail can be removed in a stripping manner.本創作提供一種光固化指甲油,其包含:一聚胺酯丙烯酸酯共聚物、2,4,6-三甲基苯甲醯基二苯基氧化膦、1-羥基環己基苯基甲酮、三丙二醇二丙烯酸酯與二乙二醇乙醚丙烯酸酯;以該光固化指甲油之總重為基準,該聚胺酯丙烯酸酯共聚物佔30wt%至70wt%,2,4,6-三甲基苯甲醯基二苯基氧化膦佔3wt%至15wt%,1-羥基環己基苯基甲酮佔3wt%至10wt%,三丙二醇二丙烯酸酯佔5wt%至20wt%,二乙二醇乙醚丙烯酸酯佔5wt%至25wt%。本創作之光固化指甲油使用時,僅需先塗佈於指甲再光固化後,即可形成凝膠指甲,不需去除指甲表面的殘膠,且凝膠指甲並可以剝除方式卸除。10‧‧‧光固化指甲油90‧‧‧可見光燈
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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