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DISPOSITIF DE DEMANDE EN GAZ, PROCEDE D'INSTALLATION, SYSTEME DE DISTRIBUTION DE GAZ, ET PROCEDE D'UTILISATION
专利权人:
L'AIR LIQUIDE; SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE;LAIR LIQUIDE; SOCIETE ANONYME POUR LETUDE ET LEXPLOITATION DES PROCEDES GEORGES CLAUDE
发明人:
KRENTLER, STEPHEN BRUCE,IRR, HANS,WOOD, BARRY,TREVENA, PAUL N.
申请号:
CA3002475
公开号:
CA3002475A1
申请日:
2016.09.02
申请国别(地区):
CA
年份:
2017
代理人:
摘要:
A gas demand device includes a primary chamber, a slave chamber, a secondary slave chamber, a timing gas flow path and a demand gas flow path all formed in a main body. The device cycles through five successive phases of operation in which: 1) a main diaphragm and a slave diaphragm are closed to disallow gas to flow through the timing gas and demand gas flow paths, 2) a main diaphragm is open while a slave diaphragm is closed to allow gas to flow through the timing gas flow path and disallow gas to flow through the demand gas flow path, 3) the main and slave diaphragms are open to allow gas to flow through the timing gas and demand gas flow paths, 4) the main diaphragm is closed while the slave diaphragm is open to disallow gas to flow through the timing gas flow path and allow gas to flow through the demand gas flow path, and 5) the main and slave diaphragms are closed to disallow gas to flow through the timing gas and demand gas flow paths.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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