Stephen Bruce KRENTLER,Hans IRR,Barry WOOD,Paul N. TREVENA
申请号：
US15255858
公开号：
US20170065790A1
申请日:
2016.09.02
申请国别(地区):
US
年份:
2017
代理人:
摘要：
A gas demand device includes a primary chamber, a slave chamber, a secondary slave chamber, a timing gas flow path and a demand gas flow path all formed in a main body. The device cycles through five successive phases of operation in which: 1) a main diaphragm and a slave diaphragm are closed to disallow gas to flow through the timing gas and demand gas flow paths, 2) a main diaphragm is open while a slave diaphragm is closed to allow gas to flow through the timing gas flow path and disallow gas to flow through the demand gas flow path, 3) the main and slave diaphragms are open to allow gas to flow through the timing gas and demand gas flow paths, 4) the main diaphragm is closed while the slave diaphragm is open to disallow gas to flow through the timing gas flow path and allow gas to flow through the demand gas flow path, and 5) the main and slave diaphragms are closed to disallow gas to flow through the timing gas and demand gas flow paths.
