Maria Pettersson,Håkan Engqvist,Johanna André,Lars Hultman
申请号：
US15810243
公开号：
US10105468B2
申请日:
2017.11.13
申请国别(地区):
US
年份:
2018
代理人:
摘要：
An implant comprises a substrate and a coating on a surface of the substrate, and the coating includes silicon nitride and has a thickness of from about 1 to about 15 micrometer wherein the silicon nitride coating has a composition defined by SixNyWz, where W is C, H and/or O, 2<；x<；4, 3<；y<；5, and z is such that the coating contains less than 20 atomic percent of C, H and O.
