Hy Si Bui,Chunhua Li,Sarah Fairneny,Luis Ortega,Mohamed Kanji,Ram Hariharan
申请号：
US13882663
公开号：
US20130224134A1
申请日:
2011.10.31
申请国别(地区):
US
年份:
2013
代理人:
摘要：
The present invention relates to a nail polish composition comprising: at least one high gloss film forming agent chosen from a styrene maleic anhydride copolymer at least one co-film forming agent chosen from an epoxy resin at least one reactive agent chosen from a combination of a polyalkyleneamine and a polyurethane, at least one polyalkyleneamine, and at least one alkoxysilane comprising at least one solubilizing functional group at least one solvent chosen from at least one volatile solvent and water optionally, at least one plasticizer and optionally, at least one colorant, wherein the composition does not require use of nitrocellulose and can be used to makeup or protect nails.
