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Nitrocellulose-free nail polish compositions
专利权人:
Luis Ortega
发明人:
Luis Ortega,Hy Si Bui,Ram Hariharan,Mohamed Kanji
申请号:
US12770886
公开号:
US09517360B2
申请日:
2010.04.30
申请国别(地区):
US
年份:
2016
代理人:
摘要:
The present invention relates to a nail polish composition, comprising at least one high gloss film forming agent chosen from an esterified styrene maleic anhydride copolymer, a non-esterified styrene maleic anhydride copolymer and mixtures thereof, at least one co-film forming agent chosen from an epoxy resin, optionally, at least one plasticizer, at least one solvent, and optionally, at least one colorant, wherein the composition does not require use of nitrocellulose and can be used to makeup or protect nails. Such compositions impart high gloss, good adhesion and long wear properties.
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