Elizabeth J. Brisbois,Hitesh Handa,Mark E. Meyerhoff
申请号：
US14765828
公开号：
US20150366831A1
申请日:
2014.02.06
申请国别(地区):
US
年份:
2015
代理人:
摘要：
A polymeric film includes a polymer matrix having at least one of a discrete RSNO adduct or a polymeric RSNO adduct associated therewith, by: covalent attachment to the polymer matrix； dispersion within the polymer matrix； or both, with the at least one of the discrete RSNO adduct or the polymeric RSNO adduct capable of releasing nitric oxide (NO). The polymer matrix is a polyurethane polymer matrix, a silicone rubber polymer matrix, or a copolymer matrix of polyurethane and silicone rubber. The polymeric film is to exhibit stability under dry conditions at 37° C. and prolonged and controllable NO release rates, when exposed to moisture or light capable of photolyzing an RSNO bond, for a predetermined amount of time from the at least one of the discrete RSNO adduct or the polymeric RSNO adduct.
