Device patterning using irradiation
- 专利权人:
- Shiva Prakash
- 发明人:
- Shiva Prakash,Nugent Troung
- 申请号：
- US11722128
- 公开号：
- US08350238B2
- 申请日:
- 2005.12.29
- 申请国别(地区):
- US
- 年份:
- 2013
- 代理人:
- 摘要：
- In one embodiment, a method for creating a pattern in a layer of an organic electronic device that includes selectively irradiating a portion of the layer is provided, and devices and sub-assemblies made by the same.
- 来源网站：
- 中国工程科技知识中心
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