Method of preventing or ameliorating psoriasis using pyrroloquinoline quinone compounds

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专利权人:

Toshikazu Kamiya;Masahiko Nakano;Kazutoshi Kikkawa;Ayako Kamimura

发明人:

Ayako Kamimura,Toshikazu Kamiya,Masahiko Nakano,Kazutoshi Kikkawa

申请号：

US12742351

公开号：

US08575190B2

申请日:

2008.11.12

申请国别(地区):

US

年份:

2013

代理人:

摘要：

The present invention provides a method for preventing or ameliorating skin psoriasis by applying as an active ingredient, a compound represented by general formula (I) or a salt thereof:(wherein R1, R2, and R3 simultaneously or separately represent a lower alkyl, lower alkenyl, lower alkynyl, aralkyl, araryl, or phenyl group, or a hydrogen atom).

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