The present invention provides a device by which a processed section is not subject to damage caused by heat, partial processing is possible, recombination or regeneration is easy after processing and injection substance can be introduced efficiently when a processed object such as cell is processed and a device generating bubbles containing plasma. A processed object can be partially processed by a partial ablation device using a bubble ejecting member without imparting damage to the processed object, the bubble ejecting member comprising: a core formed by conductive material； a contour portion, which is formed by insulating material and which covers the core and comprises a portion extending from a tip end of the core； and a gap formed between the extending portion of the contour portion and the tip end of the core. Furthermore, by the fact that an outer contour portion is further provided on the periphery of the contour portion, bubbles absorbing solution containing injection substance can be discharged, and the injection substance can be introduced while partially ablating the processed object. Furthermore, it comprises: a pair of electrodes formed by conductive material for allow inert gas to generate plasma； a liquid flow path for flowing of liquid； inner gaa； inner gas containing plasma； a micro flow path for flowing of liquid including bubbles of inner gas containing plasma, bubbles containing plasma is generated by connecting the liquid flow path and the micro flow path downstream from a portion of the micro flow path where plasma is generated, a plasma state can be maintained even in liquid, and hence a biological tissue can be treated.本發明提供在對細胞等之加工對象物進行加工時，加工部不會承受熱所造成之損害，並可局部地加工，加工後容易再結合或再生進而，可高效率地導入射出物質之裝置、及產生含有電漿之氣泡的裝置。藉使用氣泡噴出構件之局部電燒裝置，可對加工對象物局部地且不會產生損害地進行加工，而該氣泡噴出構件係包含：以導電材料所形成的芯材；外廓部，係以絕緣材料所形成，並覆蓋該芯材，而且包含從該芯材之尖端所延伸的部分；及空隙，係形成於該外廓部之延伸的部分與該芯材的尖端之間。又，藉由更將外側外廓部設置於外廓部的外周，可放出吸附了含有射出物質之溶液的氣泡，並可一面對加工對象物進行局部電燒，一面導入射出物質。又，包含一對電極，係以導電材料所形成，並用以使惰性氣體產生電漿
