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PARTICLE BEAM TREATMENT SYSTEM AND METHOD FOR RENEWING FACILITIES OF PARTICLE BEAM TREATMENT SYSTEM
专利权人:
Hitachi; Ltd.
发明人:
Hidehiro AONO
申请号:
US16217089
公开号:
US20190269941A1
申请日:
2018.12.12
申请国别(地区):
US
年份:
2019
代理人:
摘要:
To provide a particle beam treatment system and a method for renewing facilities of the particle beam treatment system with which the facilities can be renewed efficiently. A particle beam treatment system 1 includes a charged particle beam generation device 2 that generates a charged particle beam Bm, a first irradiation device 4(1) that irradiates the charged particle beam to a predetermined irradiation target, a first beam transportation device 3(1) that transports the charged particle beam from the charged particle beam generation device 2 to the first irradiation device 4(1), and a first vacuum valve 33(1) that is arranged in the first beam transportation device 3(1).
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中国工程科技知识中心
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