Alain Dijkstra,YVONNE JOHANNA MARGARETHA HOUTHUIJS
申请号：
US16377234
公开号：
US20200316270A1
申请日:
2019.04.07
申请国别(地区):
US
年份:
2020
代理人:
摘要：
Various aspects of a skin treatment device and a method to cleanse and balance pH value of skin are disclosed herein. In accordance with an embodiment, the skin treatment device includes a nozzle to be directed into contact with the skin of a subject. A vacuum pump may be operably coupled to the nozzle for generating a suction force of the nozzle to evacuate impurities from the skin. A liquid replenishing assembly may be operably coupled to the nozzle for atomizing liquid at a pre-defined pH value. The liquid from the liquid replenishing assembly may pass into the nozzle based on the pre-defined pH value. The first control valve may be connected to an outlet of the vacuum pump and an outlet of the liquid replenishing assembly for communication with the nozzle.
