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MAKEUP-ASSISTING PATCH AND MAKEUP METHOD USING THE PATCH
专利权人:
发明人:
UCHIDA, KAZUKO,WATANABE, SHUICHI,TAKAGI, YASUYO,KANESHIGE, MAMI,FUKANO, KENJI,FUJISAWA, HIROMICHI
申请号:
MYPI 2010000574
公开号:
MY148572A
申请日:
2008.06.03
申请国别(地区):
MY
年份:
2013
代理人:
摘要:
A MAKEUP-ASSISTING PATCH HAVING A LAYER STRUCTURE THAT A PRESSURE SENSITIVE ADHESIVE LAYER IS PROVIDED ON ONE SURFACE OF A BASE LAYER, WHEREIN (1) THE BASE LAYER IS A LAYER OF A POLYURETHANE ELASTOMER HAVING A GLASS TRANSITION TEMPERATURE OF 0°C OR LOWER, (2) THE PRESSURE SENSITIVE ADHESIVE LAYER IS AN ACRYLIC PRESSURE SENSITIVE ADHESIVE LAYER COMPOSED OF A COPOLYMER CONTAINING AT LEAST ONE MONOMER UNIT SELECTED FROM THE GROUP CONSISTING OF AN ALKYL ACRYLATE AND AN ALKYL METHACRYLATE EACH HAVING AN ALKYL GROUP HAVING 8 TO 12 CARBON ATOMS IN A PROPORTION OF 70% BY WEIGHT OR MORE, AND (3) THE THICKNESS OF THE BASE LAYER IS 1 TO 10 µM, THE THICKNESS OF THE PRESSURE SENSITIVE ADHESIVE LAYER IS 1 TO 15 µM, AND THE TOTAL THICKNESS OF THESE BOTH LAYERS IS 2 TO 20 µM.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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