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Deodorizing apparatus and deodorizing method
专利权人:
Ltd.;Panasonic Intellectual Property Management Co.
发明人:
Gaku Miyake,Genichiro Matsuda,Takahiro Kitai,Yoshio Yamada
申请号:
US15956373
公开号:
US10610821B2
申请日:
2018.04.18
申请国别(地区):
US
年份:
2020
代理人:
摘要:
Plasma is generated in a gas phase in a processing tub to produce a reforming component, the produced reforming component is dissolved in a liquid and is dispersed in the liquid to produce a reforming liquid, the produced reforming liquid is discharged from the processing tub to be stored in the storage tub, and gas is supplied from a gas supplier into the reforming liquid in the storage tub. The supplied gas has a bubble shape, comes into contact with the reforming liquid stored in the storage tub, and is deodorized.
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中国工程科技知识中心
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