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Illumination and observation system for an ophthalmic microscope, ophthalmic microscope comprising such a system, and microscopying method
专利权人:
LEICA INSTRUMENTS (SINGAPORE) PTE. LTD.
发明人:
Manfred Kuster,Michael Guentert
申请号:
US15750191
公开号:
US10545325B2
申请日:
2016.08.23
申请国别(地区):
US
年份:
2020
代理人:
摘要:
An illumination and observation system (1), in particular for an ophthalmic microscope, comprises a first observation pupil (4) and a second observation pupil (5) for the eyes of an observer such as an assistant. Further, the system comprises a coaxial illumination (6) in the first observation pupil (4) and a main illumination (7), the coaxial illumination (6) being adapted to generate a red reflex (13) in the observed eye in operation and the main illumination having a larger field of illumination than the coaxial illumination (6, 10, 11). To facilitate usage of the system (1) and/or the microscope (2) and to create a superior stereoscopic view using the red reflex (13), a control subsystem (21, 27) is provided which is adapted to automatically adjust an intensity of the main illumination (7) depending on a change in an intensity of the coaxial illumination (6).
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