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PLASMA INDUCED FLOW ELECTRODE STRUCTURE, PLASMA INDUCED FLOW GENERATION DEVICE, AND METHOD OF MANUFACTURING PLASMA INDUCED FLOW ELECTRODE STRUCTURE
专利权人:
发明人:
Masato AKITA,Akio UI,Yasushi SANADA
申请号:
US15210115
公开号:
US20170018409A1
申请日:
2016.07.14
申请国别(地区):
US
年份:
2017
代理人:
摘要:
In one embodiment, a plasma induced flow electrode structure has an electrode block, an insulating layer and an electrode layer. The electrode block has first and second surfaces and through holes penetrating between these first and second surfaces. The insulating layer is disposed on the first surface and inside the through holes. The electrode layer is disposed on the insulating layer of the first surface.
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