您的位置: 首页 > 农业专利 > 详情页

真菌増殖抑制剤
专利权人:
生化学工業株式会社
发明人:
西原 達次,秋房 住郎
申请号:
JP2007557890
公开号:
JP5095421B2
申请日:
2007.02.08
申请国别(地区):
JP
年份:
2012
代理人:
摘要:
A very safe and useful agent for inhibiting fungal growth and the like are provided by the present invention. Specifically, the present invention provides (1) an agent for inhibiting fungal growth comprising hyaluronic acid or a salt thereof excluding a heavy metal salt as the active ingredient, and a method for inhibiting fungal growth, which comprises at least a step of allowing hyaluronic acid or a salt thereof excluding a heavy metal salt to contact with a fungus, (2) an agent for reinforcing activity of inhibiting fungal growth possessed by a cell, which comprises a DNA encoding a hyaluronic acid synthase as the active ingredient, (3) a method for reinforcing activity of inhibiting fungal growth of a cell, which comprises at least a step of transfecting a DNA encoding a hyaluronic acid synthase into the cell, and (4) a method for inhibiting fungal growth, which comprises at least a step of allowing a cell transfected with a DNA encoding a hyaluronic acid synthase to contact with a fungus.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充