JUNG, Chang Jo,정창조,KIM, Dae Kyeong,김대경,LEE, John Hwan,이존환,KIM, Hyun Na,김현나
申请号：
KRKR2011/005412
公开号：
WO2012/011768A2
申请日:
2011.07.22
申请国别(地区):
WO
年份:
2012
代理人:
摘要：
The present invention relates to a cleanser composition for removing makeup from the skin. The composition of the present invention comprises a silicon-based surfactant and a polyol, or comprises a silicon-based surfactant, in which PEG is added to both terminals of silicon to increase hydrophilicity, and a surfactant having a foam-generating ability, to thereby effectively removing makeup and provide users with refreshed feeling after washing.La présente invention concerne une composition de nettoyant pour démaquiller la peau. La composition de la présente invention comprend un tensio-actif à base de silicium et un polyol ou un tensio-actif à base de silicium, dans lequel PEG est ajouté aux deux terminaisons du silicium pour accroître le caractère hydrophile, et un tensio-actif possédant une capacité de génération de mousse pour démaquiller efficacement et procurer aux utilisateurs une sensation de fraîcheur après le lavage.본 발명은 메이크업 세정제 조성물에 관한 것으로서, 본 발명의 조성물은 실리콘계 계면활성제 및 폴리올을 포함하거나, 또는 실리콘 양 말단에 PEG를 부가하여 친수성을 높인 실리콘계 계면활성제 및 거품 형성능이 있는 계면활성제를 포함하여 효과적으로 메이크업이 제거되면서 동시에 세안 후 개운함을 제공한다.
