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PLASMA SYSTEM
专利权人:
发明人:
Yark Yeon KIM,Han Young YU,Won Ick JANG,Yong Sun YOON,Bong Kuk LEE
申请号:
US14634416
公开号:
US20150273231A1
申请日:
2015.02.27
申请国别(地区):
US
年份:
2015
代理人:
摘要:
Provided herein is a plasma system including a nozzle including an outer circumference exposed towards outside, an inner circumference facing the outer circumference and touching gas, and an exit from which the gas is sprayed a first electrode formed on a portion of the outer circumference or inner circumference and a second electrode formed on a portion of the outer circumference and distanced from the first electrode wherein the first electrode is electrically connected to a first power having a first voltage, and the second electrode is electrically connected to a second power having a second voltage that is different from the first voltage, and the second electrode is formed closer to the exit than the first electrode.
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