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Method and apparatus for detecting crystal orientation of silicon wafer
专利权人:
Trina Solar Co., Ltd
发明人:
Fu Shaoyong,Xiong Zhen
申请号:
US201415303386
公开号:
US9965846(B2)
申请日:
2014.05.13
申请国别(地区):
美国
年份:
2018
代理人:
Marshall & Melhorn, LLC
摘要:
A method and apparatus for detecting crystal orientation of a silicon wafer is proposed. The detection method uses a camera shooting device to irradiate the silicon wafer in a rotation manner in different angular directions and obtains the corresponding reflection intensities, based on which a reflection curve is drawn for a grain of interest in a polar coordinate system; normal directions of three or more faces of a regular octahedron of a grain <111> are determined by identifying a pixel brightness extreme value in the reflection curve, and then all normal vectors of the regular octahedron are calculated, so that a crystal orientation of the grain of interest may be calculated. The camera shooting device has a light source and one or more camera shooting probes.
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