A metrology method includes the steps of positioning a point source projector at a known distance from a target site, projecting a light beam through a semi-transparent mask, forming a magnified pattern on the target site from the light beam, visually inspecting a portion of the magnified pattern that is formed on the target site, and determining a measurement of the target site based on the known dimensions of the mask pattern, a magnification factor, and the portion of the magnified pattern that is formed on the target site. The light beam diverges from a point and the semi-transparent mask has a mask pattern of known dimensions. The magnified pattern is magnified from the mask pattern by the magnification factor.
