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蒸着マスクの製造方法、金属マスク付き樹脂層、及び有機半導体素子の製造方法
专利权人:
大日本印刷株式会社
发明人:
武田 利彦,川崎 博司,小幡 勝也
申请号:
JP20130003925
公开号:
JP6123301(B2)
申请日:
2013.01.11
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a method of producing a vapor deposition mask capable of meeting both requirements of high definition and lightening even when enlarged, a metal-mask-provided resin layer used in the method of producing a vapor deposition mask, and a method of producing an organic semiconductor element enabling production of a high-definition organic semiconductor element.SOLUTION: A method of producing a vapor deposition mask (100) consisting of a metal mask (10) formed with a slit (15) and a resin mask (21) which is provided with an opening (25) corresponding to a pattern to be formed by vapor deposition at a position overlapping with the slit, with the metal mask and the resin mask being laminated, includes the steps of: preparing a metal-mask-provided resin layer (60) laminated with a metal mask and formed with a slit on one side of a resin layer (20); forming a protective layer (30) on the other side of the resin layer of the metal-mask-provided resin layer; irradiating the metal-mask-pro
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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