DESIMONE, JOSEPH M.,ROLLAND, JASON P.,EXNER, ANSLEY E.,SAMULSKI, EDWARD T.,SAMULSKI, R. JUDE,MAYNOR, BENJAMIN W.,EULISS, LARKEN E.,DENISON, GINGER M.
申请号：
CA2847260
公开号：
CA2847260C
申请日:
2004.12.20
申请国别(地区):
CA
年份:
2016
代理人:
摘要：
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high- resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.
