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Application of electron-beam induced plasma probes to inspection, test, debug and surface modifications
专利权人:
PHOTON DYNAMICS; INC.
发明人:
SALEH, NEDAL,TOET, DANIEL,STERLING, ENRIQUE,LOEWINGER, RONEN,KRISHNASWAMI, SRIRAM,GLAZER, ARIE
申请号:
TW103134654
公开号:
TW201530602A
申请日:
2014.10.03
申请国别(地区):
TW
年份:
2015
代理人:
摘要:
An electron-beam induced plasmas is utilized to establish a non-mechanical, electrical contact to a device of interest. This plasma source may be referred to as atmospheric plasma source and may be configured to provide a plasma column of very fine diameter and controllable characteristics. The plasma column traverses the atmospheric space between the plasma source into the atmosphere and the device of interest and acts as an electrical path to the device of interest in such a way that a characteristic electrical signal can be collected from the device. Additionally, by controlling the gases flowing into the plasma column the probe may be used for surface modification, etching and deposition.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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