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Headgear and process for producing the same
专利权人:
Teijin Pharma Limited
发明人:
Shimura, Hideharu,Ooya, Shin,Omura, Keiko,Fujiura, Kazuaki,Fujimoto, Shinya,Takishita, Masahide,Chin, Tongoh,Hikosaka, Toru,Nakamura, Toshiki,Kurai, Naoki
申请号:
AU2007330182
公开号:
AU2007330182B2
申请日:
2007.10.16
申请国别(地区):
AU
年份:
2012
代理人:
摘要:
A headgear that is suitable for fitting a respiratory mask system to the head ofthe user, and that can be easily produced and, while minimizing any leakage ofpositive pressure gas at pressurization, realizes good wearing sensation.There is provided a headgear used in contact with the face of the user to fix a respiratorymask for supplying the user with a respiratory positive pressure gas to the headof the user, characterized in that the headgear has a head fitting part adaptedto be fitted to the back of the head of the user and strap (3) linked to the head fittingpart, and that the head fitting part has at least one band (1) of closed curve, andthat the band of closed curve thereon has at least one junction part (2), and thatby the at least one junction part, the band of closed curve assumes a nonplanarstructure adapted to the configuration of the head of the user.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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