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Advanced Oxidative Process for Microbial Reduction
专利权人:
HARPC Solutions Inc.
发明人:
Moyer Paul,VanderVeen Mark
申请号:
US201715643037
公开号:
US2018303133(A1)
申请日:
2017.07.06
申请国别(地区):
美国
年份:
2018
代理人:
摘要:
Disclosed is system for inactivating bacteria and/or reducing microbial count on product, in particular a food product, susceptible to microbial presence, said system comprising a processing chamber which is operably connected to i) a means for generating UV-C light, ii) a means for generating hydrogen peroxide vapor and/or means for generating ozone, and iii) a heat source. Also disclosed is a method for inactivating bacteria and/or reducing microbial count on a product, in particular food product, which is susceptible to microbial presence, said method comprising subjecting said product in a processing chamber to exposure with ultraviolet C (UV-C) light and hydrogen peroxide vapor and/or ozone, and heat, for a processing time of between 5-120 seconds, wherein the hydrogen peroxide vapor is present at up to 12% v/v solution, and the temperature inside the processing chamber is maintained between about 22° C. and 60° C.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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