A method and a device for coating a vaporizing substrate are provided, wherein a film coating 12 is deposited on at least a part of a substrate 10 during the time when the substrate undergoes phase transition from essentially liquid phase to gaseous phase. Gaseous species 101 formed upon vaporizing at least the portion of the substrate material, when undergoing chemical deposition reactions in gaseous phase, produce particulate 11 that forms at least one coating layer to produce the film coating 12.
