您的位置: 首页 > 农业专利 > 详情页

Onychomycosis treatment system
专利权人:
学校法人慶應義塾;株式会社ポーラファルマ;澁谷工業株式会社
发明人:
荒井 恒憲,久保田 信雄,野澤 暁,上田 浩司,中村 進二
申请号:
JP2011545255
公开号:
JP5699091B2
申请日:
2010.12.10
申请国别(地区):
JP
年份:
2015
代理人:
摘要:
Provided is a technique whereby drug-penetrability (permeability) can be increased in the nail suffering from onychomycosis and thus therapeutic effect can be promoted. A laser irradiation device for treating onychomycosis, comprising: a laser light source; a laser transmission means that is provided with a laser irradiation site; a controlling unit for controlling the laser output; and a fixation device for fixing the laser irradiation site in a sealed state to the nail to be irradiated with laser, wherein the laser irradiation site is fixed in a sealed state, with the aforesaid fixation device, to the site of the nail to be irradiated, and then the nail is irradiated with laser to thereby form a crack through which a therapeutic for onychomycosis is penetrated into the nail.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充