RF skin treatment is provided by applying to the skin an applicator that includes a tip populated by at least one voltage to skin delivering element and an isolating transformer located proximate to the tip to reduce ground currents through parasitic capacitance. The skin impedance is monitored during an RF treatment pulse to ensure that a sufficient amount of energy is delivered to the skin to cause a desired effect. The pulse energy can be increased if the skin impedance is too low. In addition, pain can be alleviated by cutting off the RF pulse if the skin impedance is too high. Further, inefficient RF pulses can be excluded by cutting off the RF energy supply if the skin impedance is too low.美容ＲＦ皮膚トリートメントの装置において、トリートメントの最中に望ましくない電流が対象の体を流れることがないようにＲＦエネルギー供給がトリートメント対象から絶縁される。
