Materials and apparatus are provided for a skin cleansing composition with enhanced rheological properties. The skin cleansing composition includes a number of surfactants. The skin cleansing composition further includes at least one cationic antimicrobial active. The skin cleansing composition also includes a quaternary amine salt. Ratios of the components of the skin cleansing composition which provide the enhanced rheological properties are also provided. The skin cleansing composition also includes an aqueous medium in which the number of surfactants, the at least one cationic antimicrobial active and the quaternary amine salt are distributed.
