PLATING CATALYST AND METHOD

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专利权人:

Rohm and Haas Electronic Materials LLC

发明人:

Rzeznik, Maria Anna,Liu, Feng

申请号：

EP20110193191

公开号：

EP2465973(B1)

申请日:

2011.12.13

申请国别(地区):

欧洲专利局

年份:

2018

代理人:

摘要：

Stable zero-valent metal compositions and methods of making and using these compositions are provided. Such compositions are useful as catalysts for subsequent metallization of non-conductive substrates, and are particularly useful in the manufacture of electronic devices.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/