JOSEPH M. DESIMONE,JASON P. ROLLAND,ANSLEY E. EXNER,EDWARD T. SAMULSKI,R. JUDE SAMULSKI,BENJAMIN W. MAYNOR,LARKEN E. EULISS,DENISON, GINGER, M.
申请号：
PT04821787
公开号：
PT1704585T
申请日:
2004.12.20
申请国别(地区):
PT
年份:
2017
代理人:
摘要：
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.
