The present invention discloses an intravenous infusion monitoring device for monitoring the infusion dripping rate. This device is attached to an infusion tube above the dripping chamber, including two polar plates forming a capacitor, a capacitance measurement unit electrically connected to the capacitor, a micro control unit (MCU) configured to collect data from the capacitance measure unit and analysis and display the infusion dripping rate. A method for monitoring infusion rate includes setting the infusion solution surface to a specific height in the dripping chamber so that the infusion solution in the tube is conducted and have a pulse change of the capacitance at the moment when a droplet drips down, determining the cycle of the pulse corresponding to the infusion rate and displaying the dripping rate by LCD screen, and alarming when the infusion irregularities occurs such as too fast, too slow or fully stop.
