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Liquid agent for Topical Treatment of dermatophytosis
专利权人:
MEIJI SEIKA PHARMA CO.; LTD.
发明人:
FURUTA YOSHIKO,KOMATSU KAZUKI,KAYA ARPANSIREE,TAKAHATA SHO,TABATA YUJI
申请号:
CO14281705
公开号:
CO7170168A2
申请日:
2014.12.23
申请国别(地区):
CO
年份:
2015
代理人:
摘要:
In accordance with the present invention, a topical liquid agent can be provided that has antifungal activity against dermatophytes and also high permeability in nails. Topical liquid agent for nails and / or skin for the prevention or treatment of dermatophytosis comprises a film-forming agent and a compound represented by the formula (I) where R1 represents a hydrogen atom, C1-6 alkyl or otrifluoromethyl, R2 represents a hydrogen atom, C1-6 alkyl, halogen, -COO (C1-6 alkyl) or (CH2) 1– 3COOR, where R represents a hydrogen or C1-6 alkyl atom, R3 represents a hydrogen, C1-6 alkyl, amino, trifluoromethyl or OR atom,R represents a hydrogen compound, R4 represents a hydrogen compound, R5 represents a hydrogen atom, C1-6 tar, a polyhydroxy or halogen, R6 represents a hydrogen atom, C1-6 tar, sulfur trifluoride, halogen, ammonia water, nrarb, nitrogen, hydroxy-c1-6 tar, conrarb, cocoo (C1-6),-COOH, - 1-3coor u ora, R represents an anhydrous atom or C1-6 tar, RA and Rb can be the same hatred, each representing an anhydrous atom, C1-6 tar or C1-6 acid 6, R7 represents a hydrogen atom, C1-6 tar, R stands for hydrogen atom or C1-6 tar or halogenated compound, R8 stands for hydrogen atom, C1-6 tar, hydrogenated compound, nitramine or one of its salts.De acuerdo con la presente invención, se puedeproporcionar un agente líquido tópico que tenga actividadantifúngica contra dermatofitos y también altapermeabilidad en uñas.El agente líquido tópico para las uñas y/o la pielpara la prevención o el tratamiento de dermatofitosiscomprende un agente formador de película y un compuestorepresentado por la fórmula(I)en donde R1 representa un átomo de hidrógeno, alquilo C1–6 otrifluorometilo, R2 representa un átomo de hidrógeno,alquilo C1–6, halógeno, –COO(alquilo C1–6) o (CH2)1–3COOR,donde R representa un átomo de hidrógeno o alquilo C1–6, R3representa un átomo de hidrógeno, alquilo C1–6, amino,trifluorometilo u OR, donde R representa un átomo dehidrógeno o alquilo C1–6, R4 representa un g
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