Rohm and Haas Electronic Materials LLC ;Rohm and Haas Electronic Materials Korea Ltd.
发明人:
Imanari Masaaki,Lee Yil-Hak
申请号：
US201715692521
公开号：
US2018112319(A1)
申请日:
2017.08.31
申请国别(地区):
美国
年份:
2018
代理人:
摘要：
The present invention relates to a boric-acid free nickel plating composition which does not include organic carboxylic acid but has high bath-pH-stability. The nickel plating composition provides a nickel plating film suitable for the use of electronic components.
