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Mask, rectification vent, and chamber
专利权人:
レスメド・リミテッド
发明人:
ダンタ-ナラヤナ ムディタ パラディープ,ナサル サッド
申请号:
JP2008146057
公开号:
JP4904315B2
申请日:
2008.06.03
申请国别(地区):
JP
年份:
2012
代理人:
摘要:
A flow regulation vent (10) for regulating flow from a pressurized gas supply includes a fixed portion (14) adapted to engage a gas supply conduit and a spring force biased movable portion (12) connected by a hinge (16) to the fixed portion and flowingly connected to the pressurized gas supply. The fixed portion includes a gas flow orifice (20). The movable portion is pivotally movable between 1) a relaxed position, whereby at a specified minimum operating pressure, the movable portion is pivoted by the spring force away from the fixed portion to a position to establish a first gas flow area between the movable portion and the gas flow orifice and 2) a fully pressurized position, whereby at a specified maximum operating pressure, the pressurized gas offsets the spring force to pivot the movable potion to a position adjacent the fixed portion to establish a minimum gas flow area between the movable portion and the gas flow orifice. By altering characteristics of one or both of the movable portion and the fixed portion, the flow characteristics of the vent can be altered at any pressure level within a pressure operating range.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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