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Method for producing amorphous carbon film containing zinc
专利权人:
ナノテック株式会社;学校法人東京電機大学;株式会社ニチオン
发明人:
中森 秀樹,平塚 傑工,平栗 健二,大越 康晴,本田 宏志,馬目 佳信
申请号:
JP2015165304
公开号:
JP6583670B2
申请日:
2015.08.24
申请国别(地区):
JP
年份:
2019
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a material for implant comprising: 1) mechanical strength and appropriate elasticity property; 2) surface hardness and slidability; 3) bonding function to bone tissue; 4) recovery promoting function of bone tissue itself; and 5) antibacterial characteristic for suppressing proliferation of bacteria.SOLUTION: In a material for implant, a substrate holding a workpiece and a zinc target substrate arranged opposing to the substrate are installed into a vacuum furnace, sputtering on the zinc target substrate is performed by applying sputtering voltage that consists of high output impulse voltage having a predetermined pulse width between both substrates by substrate voltage applying means under introduction of a predetermined amount of rare gas into a vacuum furnace, and amorphous carbon film containing a desired zinc amount is deposited on the surface of the workpiece held by the substrate by applying voltage that consists of high output impulse voltage having a predetermined pulse width between both substrates while a predetermined amount of rare gas and hydrocarbon-based raw material gas are introduced into the vacuum furnace. In a film deposition method of an amorphous carbon film, the pulse width is 500 to less than 1000 μsec.SELECTED DRAWING: Figure 1
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