TAVARES, Jason Robert,DORVAL DION, Christopher Alex
申请号：
EP20140788740
公开号：
EP2989229(A4)
申请日:
2014.04.17
申请国别(地区):
欧洲专利局
年份:
2017
代理人:
摘要：
Methods for producing coatings on substrates are provided. These methods comprise the steps of introducing the substrate in a photo-initiated chemical vapor deposition reactor, introducing a gas precursor in the reactor, irradiating said gas precursor with UV radiation at a given wavelength, thereby at least partly photodissociating the gas precursor, until the coating is formed. In one method, the gas precursor is a mixture comprising carbon monoxide and hydrogen. In another method, the pressure in the react or is between about 0.75 and 1.25 atm and the gas precursor has an absorption cross section of about 5×10−16 cm2/molecule or less at said given wavelength. In another aspect, the substrate is ash.
