Modified release composition of highly soluble drugs

• 收藏
• 分享

专利权人:

Navin Vaya

发明人:

Navin Vaya,Rajesh Singh Karan,Sunil Sadanand Nadkarni,Vinod Kumar Gupta

申请号：

US10630348

公开号：

US08216609B2

申请日:

2003.07.29

申请国别(地区):

US

年份:

2012

代理人:

摘要：

A novel modified release dosage form comprising of a high solubility active ingredient, which utilizes dual retard technique to effectively reduce the quantity of release controlling agents a process for preparing the dosage form.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/