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HYDROGEN SUPPLY APPARATUS AND HYDROGEN SUPPLY SYSTEM
专利权人:
Ltd.;Panasonic Intellectual Property Management Co.
发明人:
YASUFUMI TAKAHASHI,KAZUHITO HATO,KUNIHIRO UKAI
申请号:
US16779693
公开号:
US20200171265A1
申请日:
2020.02.03
申请国别(地区):
US
年份:
2020
代理人:
摘要:
A hydrogen supply apparatus includes: an air path having an inlet and an outlet; a fan that is disposed in the air path and produces a flow of air from the inlet to the outlet; a first pipe having an end that forms a first supply port through which to supply hydrogen gas to the air path; a flow control device that is attached to the first pipe and adjusts a flow rate of the hydrogen gas; and a hydrogen gas sensor, disposed downstream of the fan or the end in a direction of flow of the air that detects a concentration of the hydrogen gas in the air path, where the end is disposed between the fan and the outlet or between the fan and the inlet in the air path.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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