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METHOD OF EVALUATING EVENNESS OF SUPLATAST TOSILATE CRYSTAL, EVEN CRYSTAL, AND PROCESS FOR PRODUCING THE SAME
专利权人:
发明人:
申请号:
EP05759961.5
公开号:
EP1777217B1
申请日:
2005.07.13
申请国别(地区):
EP
年份:
2012
代理人:
摘要:
Provided are a method for evaluating evenness of suplatast tosilate crystals stable suplatast tosilate crystals exhibiting evenness in optical purity and a method for producing the suplatast tosilate crystals.The method for evaluating evenness of suplatast tosilate crystals includes: (a) a step of adding a solvent to suplatast tosilate crystals to thereby dissolve 3% or less of the crystals in the solvent, and subjecting a portion of the supernatant of the resultant suspension to optical purity measurement, and (b) a step of adding a solvent to the remaining suspension to thereby dissolve the entirety of the suspension in the solvent, and subjecting a portion of the resultant solution to optical purity measurement, wherein the optical purity as measured in the step (a) is compared with the optical purity as measured in the step (b). The suplatast tosilate crystals exhibits excellent evenness and thermal stability. The method for producing the suplatast tosilate crystals is also provided.
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中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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