Asako Nagasawa,Franklin Paul Silverman,Daniel F. Heiman,Dale O. Wilson, JR.,Peter D. Petracek,Fujio Mukumoto,Hiroaki Tamaki,Takashi Moriwaki
申请号:
US14596687
公开号:
US20150201620A1
申请日:
2015.01.14
申请国别(地区):
US
年份:
2015
代理人:
摘要:
The present invention is directed to methods for enhancing root growth comprising applying a S-Benzylthiouracil compound, or a salt thereof, to a plant, plant propagation material, root zone, or root of a plant. The invention also relates to methods for reducing the harmful effects of environmentally stressful conditions on plants, such as drought, or intense temperatures, by application of a S-Benzylthiouracil compound, or a salt thereof, to a plant, plant propagation material, root zone, or root of a plant. The invention further relates to new S-Benzylthiouracil derivatives, and salts thereof.