Andrea E. SCHLATHER,Aline Aude Guimont,Daniella Cristina Gonzalez-Toro
申请号：
US16175224
公开号：
US20200129787A1
申请日:
2018.10.30
申请国别(地区):
US
年份:
2020
代理人:
摘要：
The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.
