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Irradiation apparatus with charged particle beam
专利权人:
HITACHI LTD.
发明人:
Moriyama, Kunio,Nakayama, Takahide,Nishiuchi, Hideaki
申请号:
ES08021948
公开号:
ES2644400T3
申请日:
2008.12.17
申请国别(地区):
ES
年份:
2017
代理人:
摘要:
A charged particle beam irradiation system comprises a high-speed steerer (beam dump device) 100 disposed in a course of a beam transport line 4 through which an ion beam is extracted from a charged-particle beam generator 1. The beam dump device 100 is provided with dose monitoring devices 105, 106 for measuring a dose of an ion beam applied to a beam dump 104 so that the intensity of the ion beam can be measured without transporting the ion beam to irradiation nozzles 15A through 15D. Thus, the system is capable of adjusting the intensity of an ion beam extracted from a synchrotron without operating each component of a beam transport line, and an irradiation nozzle.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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