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Method and system for correcting aberrations of the eye for an ophthalmic instrument
专利权人:
Xavier Jean-François Levecq
发明人:
Xavier Jean-François Levecq,Nicolas Chateau
申请号:
US12064065
公开号:
US08262222B2
申请日:
2005.08.18
申请国别(地区):
US
年份:
2012
代理人:
摘要:
A method for correcting aberrations of the eye applied to an ophthalmic instrument operating with an analysis light beam, including: measurement of aberrations of the eye capable of interfering with the analysis beam, correction of the phase of the wave front of the analysis beam as a function of the measured values of the aberrations, measurement of eye movements carried out independently of the measurement of aberrations, and modification of the correction of the phase of the wave front of the analysis beam as a function of the measurement of eye movements.
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中国工程科技知识中心
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