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Method for manufacturing liquid crystal device
专利权人:
Seiko Epson Corporation
发明人:
Zhang Huiping,Nakata Hideo,Seki Shinsuke,Tanaka Takao
申请号:
US201514976682
公开号:
US9989808(B2)
申请日:
2015.12.21
申请国别(地区):
美国
年份:
2018
代理人:
Harness, Dickey & Pierce, P.L.C.
摘要:
A method for manufacturing a liquid crystal device that includes forming an inorganic alignment layer by emitting an alignment film material that is made of an inorganic material in an oblique direction onto a substrate, and forming an organic alignment layer that is a monomolecular film made of an organic material chemically bonded with the inorganic alignment layer on a surface of the inorganic alignment layer by treating the surface of the inorganic alignment layer with a silane coupling agent that has an alkyl group, wherein a pretilt angle of a liquid crystal molecule is set to a desired angle by selecting the silane coupling agent by the number of carbon atoms.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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