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DIRECT PHOTOPATTERNING OF ROBUST AND DIVERSE MATERIALS
专利权人:
CALIFORNIA INSTITUTE OF TECHNOLOGY
发明人:
RAYMOND WEITEKAMP,ROBERT H. GRUBBS,HARRY A. ATWATER,JAMES FAKONAS
申请号:
US14505824
公开号:
US20150118188A1
申请日:
2014.10.03
申请国别(地区):
US
年份:
2015
代理人:
摘要:
The present invention relates to methods of metathesizing olefins using catalysts previously considered to be practically inactive. The present invention further relates to novel photosensitive compositions, their use as photoresists, and methods related to patterning polymer layers on substrates. Further, modifications to the compositions and method provide for an unprecedented functionalization of the compositions, useful for example in the preparation of sensors, drug delivery systems, and tissue scaffolds. The novel compositions and associated methods also provide for the opportunity to prepare 3-dimensional objects which provide new access to critically dimensioned devices, including for example photonic devices.
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