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COMPOSITION D'AGENT NETTOYANT
专利权人:
Shiseido Company; Ltd.
发明人:
WATANABE, Kei,MENO, Takashi
申请号:
EP17861973
公开号:
EP3530722A4
申请日:
2017.09.25
申请国别(地区):
EP
年份:
2020
代理人:
摘要:
A cleansing composition includes (A) 2 to 17.5% by mass of an anionic surfactant, (B) 1 to 17.5% by mass of an amphoteric surfactant, (C) 2.5 to 17% by mass of a hydrophilic nonionic surfactant, and (D) 0.2 to 5% by mass of an oily component. The cleansing composition does not include a substantial amount of a monoglycerin fatty acid ester or a monoalkyl monoglyceryl ether including an alkyl group or acyl group having nine carbon atoms or more. The cleansing composition does not comprise a substantial amount of a diglycerin fatty acid ester or a monoalkyl diglyceryl ether including an alkyl group or acyl group having eight carbon atoms or more.
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