LEE, HYEON YONG,이현용,SEO, YONG CHANG,서용창,CHOI, WOON YONG,최운용,KIM, JI SUN,김지선,LEE, CHOON GEUN,이춘근,SONG, CHI HO,송치호,YOON, WON BYONG,윤원병,CHO, JEONG SUB,조정섭,YIM, TAE BIN,임태빈
申请号：
KR1020120107299
公开号：
KR1020140043219A
申请日:
2012.09.26
申请国别(地区):
KR
年份:
2014
代理人:
摘要：
The present invention relates to a method which prevents the low application stability of crops due to the excessive use of ethanol by enhancing the solubility of thiamine di-lauryl sulfate and is able to reduce the amount of thiamine di-lauryl sulfate used. A process of the present invention comprises: a dry nano-pulverizing step of pulverizing thiamine di-lauryl sulfate powders into a nano-size (1) a step of manufacturing a di-lauryl sulfate ethanol solution by spraying ethanol while spraying the manufacture thiamine di-lauryl sulfate nanoparticles through a nozzle (2) a di-lauryl sulfate solution manufacturing step of treating an ultrasonic process after adding distilled water in the thiamine di-lauryl sulfate ethanol solution (3) a step of consecutively irradiating visible rays through a pulse type laser while stirring the thiamine di-lauryl sulfate solution in order to have stability without the precipitation of the thiamine di-lauryl sulfate solution (4) and a step off adding tween80 which is a dispersant with functions forming a stable emulsion after the process (5).COPYRIGHT KIPO 2014[Reference numerals] (AA) Manufacturing an aqueous solution capable of enhancing the solubility of TDS (BB) Dry nanopulverizing pretreatment process (CC) Pulverizing TDS through ultrafine vibration air (DD) Compression strength: 34-37 kg.cm^2 (EE) Moisture content: 2-6% (FF) Ultrasonic spraying process (GG) Performing an ultrasonic process on a TDS ethanol solution in which TDS nanoparticles and ethanol are dissolved through a spraying nozzle (HH) Spraying process: 100-150 g of TDS nanoparticels + 1 L of 40-60% ethanol (II) Ultrasonic process: 10 ml of TDS ethanol solution + 4990 ml of distilled water (JJ) Continuous pulse laser process (KK) Irradiating pulse type laser (LL) Pulse laser: 300 Mj, wavelength: 300-500 nm, Pulse width: 10 ns (FWHM), pulse repetition ratio:10 Hz (MM) Adding 0.1-0.5% of a dispersant tween80 based on the whole volume when pulse laser is irradiated본 발명은
